Dynavac provides precise, reliable PECVD deposition systems for commercial and military infrared applications. Our systems produce films that create a hard, smooth film for hostile-environment protection across an array of optical surfaces, including germanium and silicon optics.

Key Features

  • 24-inch diameter cathodes allow flexibility in substrate sizes, doubling throughput and eliminating the need for multiple systems
  • ­Quick-to-install systems are simple to use and require little maintenance
  • ­Self-cleaning features maximize production uptime
  • ­Deposition occurs at a constant rate set by plasma parameters, with film thickness controlled by deposition time

Key DLC System Characteristics

  • ­ Excitation 13.56 MHz
  • ­Auto-tuning matching network
  • Deposition rate more than 10nm/minute