Dynavac provides precise, reliable PECVD deposition systems for commercial and military infrared applications. Our systems produce films that create a hard, smooth film for hostile-environment protection across an array of optical surfaces, including germanium and silicon optics.
Key Features
- 24-inch diameter cathodes allow flexibility in substrate sizes, doubling throughput and eliminating the need for multiple systems
- Quick-to-install systems are simple to use and require little maintenance
- Self-cleaning features maximize production uptime
- Deposition occurs at a constant rate set by plasma parameters, with film thickness controlled by deposition time
Key DLC System Characteristics
- Excitation 13.56 MHz
- Auto-tuning matching network
- Deposition rate more than 10nm/minute